Specific X-ray Fluorescence Measuring Instruments (XRF) for Measurements and Analyses of Coating Thicknesses and Compositions on Wafers
The instruments are particularly suitable for the following applications:
- Measurements on structures on wafers in the electronics and semiconductor industries
- Analysis of very thin coatings, e.g., gold/palladium coatings of ≤ 0.1 μm (0.004 mils)
- Determination of complex multi-coating systems
- Automated measurements, e.g., in quality control
FISCHERSCOPE® X-RAY XDV®-μ WAFER
- Equipped with polycapillary X-ray optics for measurements on very small components
- Measurement spot approx. Ø 20 μm (0.8 mils) fwhm at Mo-Kα
- Very high intensities and thus good precision even for thin coatings, measurement uncertainty < 1 nm possible
- Programmable, motor-driven XY table with vacuum wafer chuck for silicon wafers up to Ø 300 mm (12 in)
FISCHERSCOPE® X-RAY XUV®773
- Universally applicable high performance instrument due changeable apertures and primary filters, micro-focus X-ray tube and silicon drift detector
- Equipped with a vacuum chmaber for maesurements in vacuum, in ambient air or with helium purge (optional)
- Programmable, motor-driven XY table, maximum travel 100 x 100 x 100 mm (3.94 x 3.94 x 3.94 in)